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Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

Queiroz,José Renato Calvacanti de; Duarte,Diego Alexandre; Souza,Rodrigo Othávio de Assunção e; Fissmer,Sara Fernanda; Massi,Marcos; Bottino,Marco Antonio
Fonte: ABM, ABC, ABPol Publicador: ABM, ABC, ABPol
Tipo: Artigo de Revista Científica Formato: text/html
Publicado em 01/01/2011 EN
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In this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O2 increased the bond strength to (32.8 ± 5.4) MPa. This value has not been achieved by traditional methods.

Evaluation of piezoresistivity properties of sputtered ZnO thin films

Cardoso,Guilherme Wellington Alves; Leal,Gabriela; Silva Sobrinho,Argemiro Soares da; Fraga,Mariana Amorim; Massi,Marcos
Fonte: ABM, ABC, ABPol Publicador: ABM, ABC, ABPol
Tipo: Artigo de Revista Científica Formato: text/html
Publicado em 01/06/2014 EN
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Zinc oxide (ZnO) thin films were deposited by RF reactive magnetron sputtering on silicon (100) substrates under different experimental conditions. ZnO films were studied before and after annealing treatment at 600 °C. The crystallinity, electrical resistivity, stoichiometry, thickness, and elastic modulus of the films were investigated. ZnO piezoresistors were produced using microelectronics processes, such as photolithography, lift-off, and reactive ion etching (RIE). Cantilever method was used to determine the gauge factor, and measurements of Temperature Coefficient of Resistance (TCR) were performed on a hotplate. The optimization of the deposition conditions produced ZnO thin films with controlled stoichiometry (ZnO), crystalline microstructure (phase wurzite, 002), high elastic modulus (156 GPa), and low electrical resistivity (0.072 ohm.cm), which are good properties for application as piezoresistive pressure microsensor. In addition, the ZnO piezoresistors had a GF of 2.6 on the deformation in the plane (100) and TCR of - 1610 ppm/K up to 250 °C.

Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering

Narvaez,Diana Marcela Devia; Restrepo,Juan Manuel Velez; Parra,Elisabeth Restrepo
Fonte: Rede Latino-Americana de Materiais Publicador: Rede Latino-Americana de Materiais
Tipo: Artigo de Revista Científica Formato: text/html
Publicado em 01/03/2015 EN
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TixAl1-xN coatings were grown using the triode magnetron sputtering technique with various bias voltages between -40 V and -150 V. As the bias voltage increased, an increase in the Al atomic percentage was observed, presenting a competition with Ti and producing structural changes. Moreover, the grain size and roughness were also strongly influenced by the bias voltage. It was observed that coatings with concentrations of approximately 25% Al and 75% Ti exhibited an optimum mixture of mechanical and tribological properties. The average coefÞcient of friction was low for the TiAlN coating that was grown at -40 V. Additionally, the critical load was obtained by measuring the adhesion using the scratch test.

The influence of discharge power and heat treatment on calcium phosphate coatings prepared by RF magnetron sputtering deposition

Yonggang, Yan; Wolke, J. G. C.; Yubao, Li; Jansen, J. A.
Fonte: Kluwer Academic Publishers-Plenum Publishers Publicador: Kluwer Academic Publishers-Plenum Publishers
Tipo: Artigo de Revista Científica
EN
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Ca–P coatings with different Ca/P ratio and composition were successfully prepared by RF magnetron sputtering deposition. The Ca/P ratio, phase composition, structure and morphological properties were characterized by XRD, FTIR, EDS and SEM analyses. All the as-sputtered coatings were amorphous and after IR-irradiation the coatings altered into a crystalline phase. The obtained coatings had a Ca/P ratio that varied from 0.55 to 2.10 and different phase compositions or mixtures of apatite, beta-pyrophosphate and beta-tricalciumphosphate structures were formed. Evidently, the phase compositions of the sputtered coatings are determined not only by the discharge power ratio of the hydroxylapatite and calcium pyrophosphate targets but also by the annealing temperature.

Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering

Hwang, Dong Hyun; Ahn, Jung Hoon; Hui, Kwun Nam; Hui, Kwan San; Son, Young Guk
Fonte: Springer Publicador: Springer
Tipo: Artigo de Revista Científica
Publicado em 05/01/2012 EN
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Zinc sulfide [ZnS] thin films were deposited on glass substrates using radio frequency magnetron sputtering. The substrate temperature was varied in the range of 100°C to 400°C. The structural and optical properties of ZnS thin films were characterized with X-ray diffraction [XRD], field emission scanning electron microscopy [FESEM], energy dispersive analysis of X-rays and UV-visible transmission spectra. The XRD analyses indicate that ZnS films have zinc blende structures with (111) preferential orientation, whereas the diffraction patterns sharpen with the increase in substrate temperatures. The FESEM data also reveal that the films have nano-size grains with a grain size of approximately 69 nm. The films grown at 350°C exhibit a relatively high transmittance of 80% in the visible region, with an energy band gap of 3.79 eV. These results show that ZnS films are suitable for use as the buffer layer of the Cu(In, Ga)Se2 solar cells.

Substrate Temperature Dependent Surface Morphology and Photoluminescence of Germanium Quantum Dots Grown by Radio Frequency Magnetron Sputtering

Samavati, Alireza; Othaman, Zulkafli; Ghoshal, Sib Krishna; Dousti, Mohammad Reza; Kadir, Mohammed Rafiq Abdul
Fonte: Molecular Diversity Preservation International (MDPI) Publicador: Molecular Diversity Preservation International (MDPI)
Tipo: Artigo de Revista Científica
Publicado em 09/10/2012 EN
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The visible luminescence from Ge nanoparticles and nanocrystallites has generated interest due to the feasibility of tuning band gap by controlling the sizes. Germanium (Ge) quantum dots (QDs) with average diameter ~16 to 8 nm are synthesized by radio frequency magnetron sputtering under different growth conditions. These QDs with narrow size distribution and high density, characterized using atomic force microscopy (AFM) and field emission scanning electron microscopy (FESEM) are obtained under the optimal growth conditions of 400 °C substrate temperature, 100 W radio frequency powers and 10 Sccm Argon flow. The possibility of surface passivation and configuration of these dots are confirmed by elemental energy dispersive X-ray (EDX) analysis. The room temperature strong visible photoluminescence (PL) from such QDs suggests their potential application in optoelectronics. The sample grown at 400 °C in particular, shows three PL peaks at around ~2.95 eV, 3.34 eV and 4.36 eV attributed to the interaction between Ge, GeOx manifesting the possibility of the formation of core-shell structures. A red shift of ~0.11 eV in the PL peak is observed with decreasing substrate temperature. We assert that our easy and economic method is suitable for the large-scale production of Ge QDs useful in optoelectronic devices.

Vehicle Exhaust Gas Clearance by Low Temperature Plasma-Driven Nano-Titanium Dioxide Film Prepared by Radiofrequency Magnetron Sputtering

Yu, Shuang; Liang, Yongdong; Sun, Shujun; Zhang, Kai; Zhang, Jue; Fang, Jing
Fonte: Public Library of Science Publicador: Public Library of Science
Tipo: Artigo de Revista Científica
Publicado em 03/04/2013 EN
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A novel plasma-driven catalysis (PDC) reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD) reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2) film prepared by radiofrequency (RF) magnetron sputtering was coated on the outer wall of the middle quartz tube, separating the catalyst from the high voltage electrode. The spiral electrodes were designed to avoid overheating of microdischarges inside the PDC reactor. Continuous operation tests indicated that stable performance without deterioration of catalytic activity could last for more than 25 h. To verify the effectiveness of the PDC reactor, a non-thermal plasma(NTP) reactor was employed, which has the same structure as the PDC reactor but without the catalyst. The real vehicle exhaust gas was introduced into the PDC reactor and NTP reactor, respectively. After the treatment, compared with the result from NTP, the concentration of HC in the vehicle exhaust gas treated by PDC reactor reduced far more obviously while that of NO decreased only a little. Moreover...

Fabrication and characterization of La2Zr2O7 films on different buffer architectures for YBa2Cu3O7−δ coated conductors by RF magnetron sputtering

Xu, Da; Liu, Linfei; Xiao, Guina; Li, Yijie
Fonte: Springer Publicador: Springer
Tipo: Artigo de Revista Científica
Publicado em 27/02/2013 EN
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La2Zr2O7 (LZO) films were grown on different buffer architectures by radio frequency magnetron sputtering for the large-scale application of YBa2Cu3O7−x (YBCO)-coated conductors. The three different buffer architectures were cerium oxide (CeO2), yttria-stabilized zirconia (YSZ)/CeO2, and CeO2/YSZ/CeO2. The microstructure and surface morphology of the LZO film were studied by X-ray diffraction, optical microscopy, field emission scanning electron microscopy, and atomic force microscopy. The LZO films prepared on the CeO2, YSZ/CeO2, and CeO2/YSZ/CeO2 buffer architectures were preferentially c-axis-oriented and highly textured. The in-plane texture of LZO film on CeO2 single-buffer architecture was ∆ φ = 5.5° and the out-of-plane texture was ∆ ω = 3.4°. All the LZO films had very smooth surfaces, but LZO films grown on YSZ/CeO2 and CeO2/YSZ/CeO2 buffer architectures had cracks. The highly textured LZO film grown on CeO2-seed buffered NiW tape was suitable for the epitaxial growth of YBCO film with high currents.

Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering

Majeed, Asif; He, Jie; Jiao, Lingrui; Zhong, Xiaoxia; Sheng, Zhengming
Fonte: Springer US Publicador: Springer US
Tipo: Artigo de Revista Científica
Publicado em 11/02/2015 EN
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Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of −50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

Optical characterization of TiAlN/TiAlON/SiO2 absorber for solar selective applications

Rebouta, L.; Pitães, A.; Andritschky, M.; Capela, P.; Cerqueira, M. F.; Matilainen, A.; Pischow, K.
Fonte: Elsevier Publicador: Elsevier
Tipo: Artigo de Revista Científica
Publicado em //2012 ENG
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Characterization of a TiAlN/TiAlON/SiO2 tandem absorber is reported in this contribution. The first two layers were deposited by magnetron sputtering and the third layer was prepared by plasma enhanced chemical vapour deposition (PECVD). The optimization was performed by determining the optical constants of individual layers by first measuring spectral transmittance and reflectance of the individual layers. Subsequently the measuring spectra were fitted using the SCOUT software and dielectric function of each layer was determined. The three layer stack absorber on copper was then designed using those optical properties. The thickness of the individual layers was optimized until a solar absorptance of 95.5% was obtained resulting in a total thickness of about 215 nm (65 nm/51 nm/100 nm for the individual layers, respectively). A thermal emittance of 5% for an absorber temperature of 100 °C was obtained by analyzing the measuring data from a FTIR spectrometer with integrating sphere. During continuous thermal annealing at 278 °C for 600 h the absorptance decreased by 0.4%; Savo Solar

Effect of RGPP process on properties of Cr–Si–N coatings

ZAIRI, Amel; NOUVEAU, Corinne; LARBI, Ahmed Beb Cheikh; IOST, Alain; MARTIN, Nicolas; BESNARD, Aurélien
Fonte: Maney Publishing Publicador: Maney Publishing
EN
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CrSiN films were deposited by reactive radio frequency magnetron sputtering in an Ar+N2 gas mixture. The nitrogen gas was injected in the deposition chamber using two methods: the classical constant injection and pulsed injection, the latter known as the reactive gas pulsing process (RGPP). Argon gas was continuously injected, whereas nitrogen gas was pulsed during the deposition. The RGPP was used to adjust the chemical composition and, consequently, allowed the improvement of the coating characteristics. The effect of process parameters such as silicon content and gas pulsing conditions (especially duty cycle α) on the crystallographic structure, chemical composition and morphology of the CrSiN layers is reported. It was found that the surface morphology evolves from a pyramid-like feature for 100% duty cycle to a typical cauliflower-like aspect, when duty cycle decreases to 84%. For shorter duty cycles, the growth produced a denser coating, with round and finer clusters.

Structural, mechanical and tribological properties of AlxCr1-xN coatings

BENLATRECHE, Yacine; NOUVEAU, Corinne; AKNOUCHE, Hamid; MARCHAL, Rémy
Fonte: Lavoisier Publicador: Lavoisier
EN
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Congrès French-Polish Seminar on Reactivity of Solids No15, Dijon , FRANCE (30/06/2008); The aim of this study was to check the influence of Al content into CrN films on their properties. CrAlN films were deposited by reactive magnetron sputtering using chromium and aluminum pure targets. The atomic content of aluminum in CrAlN films was varied from 0 to 51 at. %. It was found that the addition of Al improved the stoichiometry and the structural properties of the films. Indeed, CrAlN morphology was changed from amorphous to columnar structure. The CrAlN films present compressive residual stresses from -1.1 to -3.58 GPa. The maximum value of stress was obtained at 30 at.% of aluminum content in the films. The coatings showed a high hardness and Young's modulus, which varied between 15-36 GPA and 331-520 GPa respectively. The friction coefficient of the CrAlN films varied from 0.55 to 0.7. All the CrAlN films showed a high friction and a high wear resistance as we observed parts of the pin-on-disk ball on their surface.

The contribution of grain boundary barriers to the electrical conductivity of titanium oxide thin films

MARTIN, Nicolas; BESNARD, Aurélien; STAHL, Fabrice; VAZ, Filipe; NOUVEAU, Corinne
Fonte: American Institute of Physics Publicador: American Institute of Physics
EN
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Titanium oxide thin films were prepared by reactive magnetron sputtering. The reactive gas pulsing process was implemented to control the oxygen injection in the deposition process and,consequently, to tune the oxygen concentration in the films from pure titanium to stoichiometric TiO2, maintaining a homogeneous in-depth concentration. The electrical conductivity of the films was investigated as a function of the oxygen injection time, the metalloid concentration and temperature, in the range 90–600 K. The curved Arrhenius plots of the conductivity were examined taking into account the grain boundary limited transport model of Werner J. H. Werner Solid State Phenom. 37–38, 213 1994 . The grain barrier heights were found to depend significantly on the oxygen supplied into the deposition process and thus, on the oxygen-to-titanium atomic ratio in the films. The analysis as a function of temperature showed that the conduction mechanism in the coatings was not solely limited by the oxygen-to-titanium atomic ratio, but also by the grain boundary scattering.

Study of the wear behaviour of carbide-tipped tools untreated and CrN-treated in the field of the breaking up of the pine of Alep

AKNOUCHE, Hamid; ZERIZER, Abdellatif; NOUVEAU, Corinne; BENLATRECHE, Yacine
Fonte: Presses Polytechniques et Universitaires Romandes Publicador: Presses Polytechniques et Universitaires Romandes
EN
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This work aims to present an experimental step related to a technique of wood machining in order to evaluate wear for the case of the breaking up of the pine of Alep. In our case the study has been done with one untreated and one CrN-coated carbide tools by magnetron sputtering. The deposition conditions were already optimized in previous studies. The routing machine was equipped with a numerical control RECORD1, manufactured by the Italian firm SCM spa and located at the ENSAM of Cluny.; Programme PAI Tassili (2004-2008)

Structural and mechanical analysis for the optimization of PVD oxide coatings for protection against metal dusting

Lopez, L. M.; Salas, O.; Melo-Maximo, L.; Oseguera, J.; Lepienski, C. M.; Soares, P.; Torres, R. D.; Souza, R. M.
Fonte: ELSEVIER SCIENCE BV; AMSTERDAM Publicador: ELSEVIER SCIENCE BV; AMSTERDAM
Tipo: Artigo de Revista Científica
ENG
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The evolution of the structure and properties of Cr/Cr oxide thin films deposited on HK40 steel substrates by reactive magnetron sputtering (RMS) was investigated and linked to their potential protective behavior against metal dusting. Deposition time, mode of oxygen feeding, and application of bias voltage were varied to assess their effect on the density, adhesion, and integrity of the films. All the films showed a very fine columnar microstructure and the presence of amorphous Cr oxide. Both, an increasing time and a constant oxygen flow during deposition led to the development of relatively low density films and mud-like cracking patterns. A graded oxygen flow resulted in films with fewer cracks, but a careful control of the oxygen flow is required to obtain films with a truly graded structure. The effect of the bias voltage was much more significant and beneficial. An increasing negative bias voltage resulted in the development of denser films with a transition to an almost crack-free structure and better adhesion. The amorphous oxide resulted in low values of hardness and Young's modulus. (C) 2012 Elsevier B.V. All rights reserved.; National Council for Scientific and Technological Development (CNPq), Brazil [490931/2008-1]; CONACYT...

Influence of thickness and coatings morphology in the antimicrobial performance of zinc oxide coatings

Carvalho, P.; Sampaio, Paula; Azevedo, Sofia; Vaz, Catarina Oliveira; Espinós, J. P.; Teixeira, Vasco M. P.; Carneiro, Joaquim A. O.
Fonte: Elsevier Publicador: Elsevier
Tipo: Artigo de Revista Científica
Publicado em //2014 ENG
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"Author's copy"; In this research work, the production of undoped and silver (Ag) doped zinc oxide (ZnO) thin films for food-packaging applications were developed. The main goal was to determine the influence of coatings morphology and thickness on the antimicrobial performance of the produced samples. The ZnO based thin films were deposited on PET (Polyethylene terephthalate) substrates by means of DC reactive magnetron sputtering. The thin films were characterized by optical spectroscopy, X-Ray Diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and Scanning Electron Microscopy (SEM). The antimicrobial performance of the undoped and Ag-doped ZnO thin films was also evaluated. The results attained have shown that all the deposited zinc oxide and Ag-doped ZnO coatings present columnar morphology with V-shaped columns. The increase of ZnO coatings thickness until 200 nm increases the active surface area of the columns. The thinner samples (50 and 100 nm) present a less pronounced antibacterial activity than the thickest ones (200–600 nm). Regarding Ag-doped ZnO thin films, it was verified that increasing the silver content decreases the growth rate of Escherichia coli and decreases the amount of bacteria cells present at the end of the experiment.

Thermochromic properties of vanadium oxide films prepared by dc reactive magnetron sputtering

Cui, Hai-Ning; Teixeira, Vasco M. P.; Meng Lijian; Wang, Rong; Gao, Jin-Yue; Fortunato, E.
Fonte: Elsevier Publicador: Elsevier
Tipo: Artigo de Revista Científica
Publicado em 15/02/2008 ENG
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A transparent vanadium oxide film has been one of the most studied electrochromic (EC) and Thermochromic (TC) materials. Vanadium oxide films were deposited at different substrate temperatures up to 400 °Cand different ratios of the oxygen partial pressure (PO2). SEM,AFMand X-ray diffraction's results show detail structure data of the films. IR mode assignments of the films measured by IR reflection–absorbance in NGIA (near grazing incidence angle) are given. It is found that the film has V2O5 and VO2 combined structures. The films exhibit clear changes in transmittance when the environment temperature (Te) is varied, especially in the 3600–4000 cm−1 range. Applying a Te that is higher than a critical temperature (Tc) to the samples, the as-RT (room temperature) deposited film with 9% PO2 has a transmittance variation of 30%, but the films that were deposited on a heated substrate of 400 °C have little variation. There is tendency of bigger variation in transmittance for the sample deposited at a larger PO2, when it is applied by 200 °C Te.

Effect of substrate bias voltage on amorphous Si–C–N films produced by PVD techniques

Cunha, L.; Moura, C.; Leme, J.; Andrês, G.; Pischow, K.
Fonte: Elsevier Publicador: Elsevier
Tipo: Artigo de Revista Científica
Publicado em 30/01/2004 ENG
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SixCyNz thin films were deposited by reactive magnetron sputtering in glass and steel substrates. The films were grown in a rotation mode over a carbon and a silicon targets in a mixed Ar/N2 atmosphere. The substrates were held at a substrate temperature of 573 K. The argon flow was kept constant (100 sccm) and the nitrogen flow was 20 sccm or 25 sccm, in each one of the two series of produced films, resulting in a working pressure around 0.5 Pa. The substrate bias varied between grounded and -100 V. The films were analysed with respect to microstructure, state of chemical bonding and optical properties by X-Ray Diffraction (XRD), Raman Spectroscopy (RS), optical reflectance and transmittance. Raman spectroscopy was used as a probe of microstructural modifications induced by deposition conditions. The main features observed in RS spectra are the well-known D- and G-bands characteristic of amorphous carbon materials. The position, widths and intensity ratio of these bands are found to be dependent of the films deposition conditions. The refractive index, absorption coefficient, optical band gap and also the thickness were calculated from transmittance spectra obtained between 200 nm and 2500 nm.The residual stress of the coatings depends on deposition conditions and was calculated by measuring the substrate curvature before and after film deposition. The curvature of the samples was measured by laser triangulation in two series of two orthogonal directions. All coatings were in a state of compressive residual stress. The average hardness and Young’s modulus of the produced coatings is about 16 GPa and 170 GPa...

Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering

Jian, Sheng-Rui; Chang, Huang-Wei; Tseng, Yu-Chin; Chen, Ping-Han; Juang, Jenh-Yih
Fonte: Springer Publicador: Springer
Tipo: Artigo de Revista Científica
Publicado em 25/06/2013 EN
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The nanomechanical properties of BiFeO3 (BFO) thin films are subjected to nanoindentation evaluation. BFO thin films are grown on the Pt/Ti/SiO2/Si substrates by using radio frequency magnetron sputtering with various deposition temperatures. The structure was analyzed by X-ray diffraction, and the results confirmed the presence of BFO phases. Atomic force microscopy revealed that the average film surface roughness increased with increasing of the deposition temperature. A Berkovich nanoindenter operated with the continuous contact stiffness measurement option indicated that the hardness decreases from 10.6 to 6.8 GPa for films deposited at 350°C and 450°C, respectively. In contrast, Young's modulus for the former is 170.8 GPa as compared to a value of 131.4 GPa for the latter. The relationship between the hardness and film grain size appears to follow closely with the Hall–Petch equation.

Influence of high frequency and moderate energy pulses on DLC deposition onto metallic substrates by magnetron sputtering technique

Oliveira,R. M.; Hoshida,L.; Ueda,M.; Baba,K.
Fonte: Sociedade Brasileira de Física Publicador: Sociedade Brasileira de Física
Tipo: Artigo de Revista Científica Formato: text/html
Publicado em 01/06/2009 EN
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The deposition of Diamond-like carbon (DLC) films brings excellent mechanical, chemical, optical and electronic properties to a large range of materials. However, a problem to be overcome is its poor adhesion on metallic substrates. Usually, a silicon layer must be deposited on the surface of metals previous to DLC film deposition. In fact, in our experiments using conventional Magnetron Sputtering (MS) technique for deposition of DLC film on metal surfaces (AISI 304 stainless steel, Al 2024, Ti-6Al-4V), the silicon interlayer was crucial to avoid delamination. However, a combined process using MS and high frequency and moderate energy pulses (2.5kV/6µs/1.25 kHz), was successful to grow DLC film without the interlayer. Additionally, by monitoring the stress and the thickness in silicon samples after the processes, it was possible to correlate the conditions of operation with such characteristics. Stress measurements carried out by a profilometer and calculated by Stoney's equation varied from 2 GPa to 10.5 GPa depending on the conditions of operation of the process (pressure, distance source-substrate, frequency, length and intensity of the pulse). The thickness, the composition, the structure and the morphology of DLC coatings deposited in such metallic surfaces were obtained. Tribological and corrosion tests were also performed.